Silicon VLSI Technology: Fundamentals, Practice, and Modeling (Prentice Hall Electronics and Vlsi Series) | 
 enlarge | Authors: James D. Plummer, Michael D. Deal, Peter B. Griffin
Publisher: Prentice Hall
Category: Book
List Price: $144.33
Buy New: $72.00
You Save: $72.33 (50%)
New (21) Used (15) from $55.00
Avg. Customer Rating:  5 reviews
Sales Rank: 163326
Media: Hardcover
Edition: US Ed
Number Of Items: 1
Pages: 817
Shipping Weight (lbs): 3.9
Dimensions (in): 9.3 x 7.6 x 1.4
ISBN: 0130850373
Dewey Decimal Number: 621.395
EAN: 9780130850379
ASIN: 0130850373
Publication Date: July 24, 2000
Availability: Usually ships in 1-2 business days
Shipping: Expedited shipping available
Condition: HARDCOVER US EDITION
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| Customer Reviews:
one of the best resource out there. June 21, 2008
4 out of 4 found this review helpful
if your an electrical / process engineer, this is one of the must have books.
Reader February 20, 2007
2 out of 2 found this review helpful
A superbly written book on fabrication of silicon integrated circuits.Chapter 2 provides a gentle yet fairly detailed introduction to the overall process and each item touched therein is expanded subsequently.The language is clear and figures convey their intended meaning,overall its a wonderful starting point for further study in silicon integrated circuits technology.As has been pointed out in one of the reviews here, this book has been adopted in many US universities.The link embedded in this review is one such instance and as such can be used to obtain more information and benefit from a full set of audio lectures, assignemnts and other supplementary material as a part of MIT's open course ware program.The instructor is Prof Judy Hoyt.
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Integrated view of modern CMOS technology from the world expert August 16, 2006
3 out of 3 found this review helpful
I've read a number of books in this field - Plummer, Wolf, Campbell, Sze, Madou. Each book has its strength, and Plummer's book stands out in terms of its broad, in-depth coverage of modern silicon CMOS technology. It doesn't cover MEMS or other exotic nanofabrication.
Many students who've read the book said that Chap 2, where a modern CMOS process flow is described step by step from the substrate to back-end, was the best part. By doing so, the authors teach us that not only unit processes but their collection, i.e. process integration, is the key in successful CMOS technology.
Overall, the quality of the content and attention to small details are superb, as one can expect from a book written by one of world's foremost researchers in the field (Plummer is the Dean of Engineering School at Stanford). In particular, I liked chap2 for integrated description of CMOS flow, the lithography chapter which covers optical systems, details of photoresists, phase shift masking. Also, diffusion and ion implantation parts are second to none, since the authors made numerous contributions to the research field. It's such pleasure to learn about the latest in silicon IC processing from the Silicon Valley authority at Stanford!
The book has been adopted by many US engineering schools already, and I see it on many bookshelves belonging to IC engineers. If you need an authoritive, well-organized reference for modern silicon IC processing, I strongly recommend this book.
Excellent source on MODERN silicon vlsi technology February 13, 2005
3 out of 3 found this review helpful
The best part of this book is that it covers modern fabrication technology. I expecially liked the approach of introducing the complete CMOS fabrication flow in the beginning. It puts a context to following chapters. It is what I call system level approach for slicon fabrication. There is also emphasis on measurement and simulutions that are missing from traditional books. Both these are essential to modern technology. Also, I was very happy to see details on manufacturing choices - e.g. LOCOS vs STI. Explanations are clear.
This is a text book, therefore at times may seem too dense, but definitely worth it if you are a process engineer.
Excellent combinations of basics & updated research September 1, 2000
Before this book was published, Wolf & Tauber's book was the only good reference I had. Plummer's new book has a thorough review of basic principles, very well updated parts on current manufacturing equipments (Wolf's book also has extensive coverage in this respect). The best part in my opinion is oxidation & diffusion parts where the authors are one of the leaders in current research. The book not only focuses on the specific details, but also gives an integrated view of the whole CMOS fabrication process, which I enjoyed a lot. I strongly recommend this book for students who want to learn basics of IC fabrication and also professional engineers who needs a good and well updated reference.
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